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1 article(s) from Lau, Kenneth K S

Oxidative chemical vapor deposition of polyaniline thin films

Yuriy Y. Smolin,
Masoud Soroush and
Kenneth K. S. Lau

Beilstein J. Nanotechnol. 2017, 8, 1266–1276, doi:10.3762/bjnano.8.128

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Figure 1: Chemical structure of the primary oxidation states of PANI in the undoped, base form. (a) Fully red...

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Figure 2: (a) oCVD process highlighting important process parameters, including substrate temperature (T_s), f...

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Figure 3: FTIR of as-deposited oCVD PANI films based on the experimental conditions in Table 1. Effect of (a) reacto...

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Figure 4: FTIR of washed oCVD PANI films based on the experimental conditions in Table 1. Effect of (a) reactor pres...

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Figure 5: Top-down SEM of (a) as-deposited, and (b) THF-washed oCVD PANI films. Scale bar is 200 nm.

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Figure 6: High-resolution C1s and N1s XPS spectra of as-deposited (left) and washed (right) oCVD PANI films. ...

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Published 16 Jun 2017

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